Vaglio Pret, AlessandroAlessandroVaglio PretGronheid, RoelRoelGronheidGraves, TreyTreyGravesSmith, Mark D.Mark D.SmithBiafore, JohnJohnBiafore2021-10-192021-10-1920111537-1646https://imec-publications.be/handle/20.500.12860/19934Mask absorber roughness impact in extreme ultraviolet lithographyJournal article