Raising oxide: nitride selectivity to aid in the CMP of shallow trench isolation type applications

Mills, C. R.C. R.MillsGrover, G. S.G. S.GroverMueller, B. L.B. L.MuellerSteckenrider, J. S.J. S.SteckenriderGaneshkumar, S.S.GaneshkumarLeach, G. W.G. W.LeachHuang, C. K.C. K.HuangGrillaert, JoostJoostGrillaert2021-09-302021-09-301997https://imec-publications.be/handle/20.500.12860/2025Raising oxide: nitride selectivity to aid in the CMP of shallow trench isolation type applicationsProceedings paper