Driessen, FrankFrankDriessenVandenberghe, GeertGeertVandenbergheErcken, MoniqueMoniqueErckenMontgomery, PatrickPatrickMontgomeryRonse, KurtKurtRonseVan Adrichem, PaulPaulVan AdrichemLi, J.J.LiLiu, H.Y.H.Y.LiuKarklin, L.L.Karklin2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6288Complementary phase-shift mask towards 70-nm technology nodeProceedings paper