High depth resolution characterization of the damage and annealing behaviour of ultrashallow As-implants in Si

van den Berg, J.A.J.A.van den BergArmour, D.G.D.G.ArmourWerner, M.M.WernerWhelan, S.S.WhelanVandervorst, WilfriedWilfriedVandervorstClarysse, TrudoTrudoClarysseCollart, E.H.J.E.H.J.CollartGoldberg, R.D.R.D.GoldbergBailey, P.P.BaileyNoakes, T.C.Q.T.C.Q.Noakes2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6918High depth resolution characterization of the damage and annealing behaviour of ultrashallow As-implants in SiProceedings paper