Duan, G.XG.XDuanZhang, C. X.C. X.ZhangZhang, E.X.E.X.ZhangFleetwood, D.M.D.M.FleetwoodSchrimpf, R.DR.DSchrimpfReed, R. A.R. A.ReedLinten, DimitriDimitriLintenMitard, JeromeJeromeMitard2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22285Negative bias temperature instabilities in SiGe-pMOSFETs with SiO2/HfO2 gate dielectricsMeeting abstract