Application of moist ozone gasphase for removal of resist and organic contamination in a novel tank-type processor

Haug, RainerRainerHaugCornelissen, IngridIngridCornelissenClaes, MartineMartineClaesDe Gendt, StefanStefanDe GendtWolke, K.K.WolkeMeuris, MarcMarcMeurisHeyns, MarcMarcHeyns2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3496Application of moist ozone gasphase for removal of resist and organic contamination in a novel tank-type processorMeeting abstract