Performance and manufacturability of the Co/Ti (cap) silicidation process for 0.25μm MOS technologies

Lauwers, AnneAnneLauwersBesser, PaulPaulBesserde Potter de ten Broeck, MurielMurielde Potter de ten BroeckKondoh, EiichiEiichiKondohRoelandts, NicoNicoRoelandtsSteegen, AnAnSteegenStucchi, MicheleMicheleStucchiMaex, KarenKarenMaex2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2710Performance and manufacturability of the Co/Ti (cap) silicidation process for 0.25μm MOS technologiesProceedings paper