LCDU decomposition and scaling: mask and resist effects on local MEEF and stochastics

Gustas, DominykasDominykasGustasBorman, SamSamBormanOorschot, DorotheDorotheOorschotBekaert, JoostJoostBekaertVan Loo, HilbertHilbertVan LooHorsten, FrankFrankHorstenVaenkatesan, VidyaVidyaVaenkatesanColina, AlbertoAlbertoColinavan Rhee, TasjaTasjavan Rhee2025-07-012025-05-112025-07-012024978-1-5106-8155-20277-786XWOS:001467876500025https://imec-publications.be/handle/20.500.12860/45647LCDU decomposition and scaling: mask and resist effects on local MEEF and stochasticsProceedings paper10.1117/12.3034695978-1-5106-8156-9WOS:001467876500025