Nye, RachelRachelNyeVan Dongen, KaatKaatVan DongenOka, HironoriHironoriOkaFurutani, HajimeHajimeFurutaniParsons, GregoryGregoryParsonsDe Simone, DaniloDaniloDe SimoneDelabie, AnneliesAnneliesDelabie2023-06-052022-09-082023-06-052022978-1-5106-4985-90277-786XWOS:000844546500011https://imec-publications.be/handle/20.500.12860/40377Improving polymethacrylate EUV resists with TiO2 area-selective depositionProceedings paper10.1117/12.2613815978-1-5106-4986-6WOS:000844546500011ATOMIC LAYER DEPOSITION