Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques

Vleeming, BertBertVleemingMaenhoudt, MireilleMireilleMaenhoudtQuaedackers, JohnJohnQuaedackersvan der Heijden, EddyEddyvan der Heijdende Haas, PaulPaulde HaasUzunbajakau, SiarheiSiarheiUzunbajakauMeessen, JeroenJeroenMeessenDicker, GeraldGeraldDickerFinders, JoJoFindersDusa, MirceaMirceaDusaJaenen, PatrickPatrickJaenenLocorotondo, SabrinaSabrinaLocorotondo2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/13193Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniquesOral presentation