Aqueous photoresist and BARC wet strip in BEOL MHM patterning using UV and ozonated chemistry

Kesters, ElsElsKestersVereecke, GuyGuyVereeckeLux, MarcelMarcelLuxPittevils, JorisJorisPittevilsStruyf, HerbertHerbertStruyf2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19169Aqueous photoresist and BARC wet strip in BEOL MHM patterning using UV and ozonated chemistryMeeting abstract