Influence of environments on the footprint of particle contamination on EUV mask

Kim, Tae-GonTae-GonKimDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeynsKesters, ElsElsKestersStruyf, HerbertHerbertStruyfMertens, PaulPaulMertens2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19179Influence of environments on the footprint of particle contamination on EUV maskMeeting abstract