Impact of the low temperature gate dielectrics on device performance and bias-stress stabilities of a-IGZO thin-film transistors

Nag, ManojManojNagBhoolokam, AjayAjayBhoolokamSteudel, SoerenSoerenSteudelGenoe, JanJanGenoeGroeseneken, GuidoGuidoGroesenekenHeremans, PaulPaulHeremans2021-10-222021-10-2220152162-8769https://imec-publications.be/handle/20.500.12860/25680Impact of the low temperature gate dielectrics on device performance and bias-stress stabilities of a-IGZO thin-film transistorsJournal articlehttp://jss.ecsdl.org/content/4/8/N99.full