Biafore, JohnJohnBiaforeSmith, MarkMarkSmithMack, Chris A.Chris A.MackThackeray, JamesJamesThackerayGronheid, RoelRoelGronheidRobertson, StewartStewartRobertsonGraves, TreyTreyGravesBlankenship, DavidDavidBlankenship2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/14999Statistical simulation of resist at EUV and ArFProceedings paper