Development of a contact edge roughness measurement methodology and its sources in 193nm patterning

Vandeweyer, TomTomVandeweyerMaerhoudt,Maerhoudtde Marneffe, Jean-FrancoisJean-Francoisde MarneffeDirksen, PeterPeterDirksen2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/8336Development of a contact edge roughness measurement methodology and its sources in 193nm patterningProceedings paper