Seo, F.F.SeoBellenger, FlorenceFlorenceBellengerChung, K.B.K.B.ChungHoussa, MichelMichelHoussaMeuris, MarcMarcMeurisHeyns, MarcMarcHeynsLukovsky, G.G.Lukovsky2021-10-182021-10-1820090021-8979https://imec-publications.be/handle/20.500.12860/16201Extrinsic interface formation of HfO2 and Al2O3 /GeOx gate stacks on Ge (100) substratesJournal article