Characterization of EUV optics contamination due to photoresist related outgassing

Pollentier, IvanIvanPollentierGoethals, MiekeMiekeGoethalsGronheid, RoelRoelGronheidSteinhoff, J.J.SteinhoffVan Dijk, J.J.Van Dijk2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17818Characterization of EUV optics contamination due to photoresist related outgassingProceedings paper