Impact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generations

Finders, JoJoFindersRonse, KurtKurtRonseVan den hove, LucLucVan den hoveVan Driessche, VeerleVeerleVan DriesscheTzviatkov, PlamenPlamenTzviatkov2021-09-302021-09-301997https://imec-publications.be/handle/20.500.12860/1882Impact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generationsProceedings paper