Ion-implantation-based low-cost Hk/MG process for CMOS low-power application

Ortolland, ClaudeClaudeOrtollandSahhaf, SaharSaharSahhafSrividya, VidyaVidyaSrividyaDegraeve, RobinRobinDegraeveSaino, KantaKantaSainoKim, Chul-SungChul-SungKimGilbert, MatthieuMatthieuGilbertKauerauf, ThomasThomasKaueraufCho, Moon JuMoon JuChoDehan, MorinMorinDehanSchram, TomTomSchramTogo, MitsuhiroMitsuhiroTogoHoriguchi, NaotoNaotoHoriguchiGroeseneken, GuidoGuidoGroesenekenBiesemans, SergeSergeBiesemansAbsil, PhilippePhilippeAbsilVandervorst, WilfriedWilfriedVandervorstGealy, DanDanGealyHoffmann, Thomas Y.Thomas Y.Hoffmann2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17747Ion-implantation-based low-cost Hk/MG process for CMOS low-power applicationProceedings paper