Le, Quoc ToanQuoc ToanLeKlipp, AndreasAndreasKlippLux, MarcelMarcelLuxLi, YunlongYunlongLiZhao, LarryLarryZhaoVereecke, GuyGuyVereecke2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15681Removal of photoresist and BARC in Cu BEOL using an all-wet processProceedings paper