Ohtomi, EisukeEisukeOhtomiPhilipsen, VickyVickyPhilipsenSeveri, JorenJorenSeveriWelling, UlrichUlrichWellingTanaka, YusukeYusukeTanakaDe Simone, DaniloDaniloDe Simone2022-12-092022-09-082022-12-092022978-1-5106-4985-90277-786XWOS:000844546500019https://imec-publications.be/handle/20.500.12860/40386Resist line edge roughness mitigation for high-NA EUVLProceedings paper10.1117/12.2605822978-1-5106-4986-6WOS:000844546500019