O'Connor, RobertRobertO'ConnorHughes, GregGregHughesDegraeve, RobinRobinDegraeveKaczer, BenBenKaczerKauerauf, ThomasThomasKauerauf2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10948Reliability of HfSiON gate dielectricsJournal article