In-situ spatial analysis of RF voltage during plasma etching

Milenin, AlexeyAlexeyMileninde Marneffe, Jean-FrancoisJean-Francoisde MarneffeStruyf, HerbertHerbertStruyf2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14167In-situ spatial analysis of RF voltage during plasma etchingMeeting abstracthttp://ecsmeet5.peerx-press.org/ms_files/ecsmeet5/2007/12/20/00001552/00/1552_0_art_0_jtcndz.pdf