On the activation and passivation of precursors for process-induced positive charges in Hf-dielectric stacks

Chang, M.H.M.H.ChangZhao, C.Z.C.Z.ZhaoJi, Z.Z.JiZhang, J.F.J.F.ZhangGroeseneken, GuidoGuidoGroesenekenPantisano, LuigiLuigiPantisanoDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-172021-10-1720090021-8979https://imec-publications.be/handle/20.500.12860/15079On the activation and passivation of precursors for process-induced positive charges in Hf-dielectric stacksJournal article