Mechanisms of film deposition from BCl3-based plasma during dry etching

Shamiryan, DenisDenisShamiryanEfremov, AlexanderAlexanderEfremovSerlenga, VitoVitoSerlengaBaklanov, MikhaïlMikhaïlBaklanovBoullart, WernerWernerBoullart2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16206Mechanisms of film deposition from BCl3-based plasma during dry etchingProceedings paper