High-Q photonic crystal nanocavities on 300 mm SOI substrate fabricated by 193 nm immersion lithography

Xie, WeiqiangWeiqiangXieFiers, MartinMartinFiersSelvaraja, ShankarShankarSelvarajaVan Campenhout, JorisJorisVan CampenhoutAbsil, PhilippePhilippeAbsilVan Thourhout, DriesDriesVan Thourhout2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21867High-Q photonic crystal nanocavities on 300 mm SOI substrate fabricated by 193 nm immersion lithographyProceedings paper