Erdmann, AndreasAndreasErdmannMesilhy, HazemHazemMesilhyEvanschitsky, PeterPeterEvanschitskyPhilipsen, VickyVickyPhilipsenTimmermans, FrankFrankTimmermansBauer, MarkusMarkusBauer2021-10-282021-10-282020https://imec-publications.be/handle/20.500.12860/35102Perspectives and tradeoffs of novel absorber materials for high NA EUV lithographyProceedings paperhttps://doi.org/10.1117/12.2550882