Resist coating and developing process technology toward EUV manufacturing sub 7nm node

Kamei, YuyaYuyaKameiShiozawa, TakahiroTakahiroShiozawaKawakami, ShinichiroShinichiroKawakamiShite, HideoHideoShiteIchinomiya, HiroshiHiroshiIchinomiyaHashimoto, YusakuYusakuHashimotoEnomoto, MasashiMasashiEnomotoNafus, KathleenKathleenNafusSonoda, AkihikoAkihikoSonodaDemand, MarcMarcDemandFoubert, PhilippePhilippeFoubert2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/31006Resist coating and developing process technology toward EUV manufacturing sub 7nm nodeProceedings paperhttps://ieeexplore.ieee.org/document/8651154