Impact of Ni-silicide grain orientation on the strain and stress fields induced in patterned silicon

Torregiani, CristinaCristinaTorregianiMaex, KarenKarenMaexBenedetti, AlessandroAlessandroBenedettiBender, HugoHugoBenderVan Houtte, P.P.Van HouttePawlak, BartekBartekPawlakKittl, JorgeJorgeKittl2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12983Impact of Ni-silicide grain orientation on the strain and stress fields induced in patterned siliconJournal article