2D self-aligned via patterning strategy with EUV single exposure in 3nm technology

Choi, SuhyeongSuhyeongChoiLee, Jae UkJae UkLeeBlanco, VictorVictorBlancoKim, Ryan Ryoung hanRyan Ryoung hanKimShin, YoungsooYoungsooShin2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/280312D self-aligned via patterning strategy with EUV single exposure in 3nm technologyProceedings paperhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/10143/1014321/2D-self-aligned-via-patterning-strategy-with-EUV