Impact of advanced patterning options, 193nm and EUV, on local interconnect performance

Stucchi, MicheleMicheleStucchiTokei, ZsoltZsoltTokeiDemuynck, StevenStevenDemuynckSiew, Yong KongYong KongSiew2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21564Impact of advanced patterning options, 193nm and EUV, on local interconnect performanceProceedings paper