Process optimization and improvement of contact hole CDU and pattern placement with grapho-epitaxy DSA with EUV patterned templates

Boeckx, CarolienCarolienBoeckx2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/27869Process optimization and improvement of contact hole CDU and pattern placement with grapho-epitaxy DSA with EUV patterned templatesProceedings paper