Growth and characterization of single and mixed metal oxides by ALCVD on various surfaces for high-k gate stack applications

Caymax, MattyMattyCaymaxBrijs, BertBertBrijsCarter, RichardRichardCarterClaes, MartineMartineClaesConard, ThierryThierryConardDe Gendt, StefanStefanDe GendtDelabie, AnneliesAnneliesDelabieHeyns, MarcMarcHeynsRichard, OlivierOlivierRichardVandervorst, WilfriedWilfriedVandervorstZhao, ChaoChaoZhaoMaes, JanJanMaesChen, JerryJerryChenCosnier, VincentVincentCosnierGreen, MartinMartinGreenKaushik, VidyaVidyaKaushikKluth, JonJonKluthTsai, WilmanWilmanTsai2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6087Growth and characterization of single and mixed metal oxides by ALCVD on various surfaces for high-k gate stack applicationsOral presentation