Defect passivation in chemical vapour deposited fine-grained polycrystalline silicon by plasma hydrogenation

Carnel, LodewijkLodewijkCarnelGordon, IvanIvanGordonVan Nieuwenhuysen, KrisKrisVan NieuwenhuysenVan Gestel, DriesDriesVan GestelBeaucarne, GuyGuyBeaucarnePoortmans, JefJefPoortmans2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10189Defect passivation in chemical vapour deposited fine-grained polycrystalline silicon by plasma hydrogenationJournal article