Kubicek, StefanStefanKubicekCarter, RichardRichardCarterCartier, EduardEduardCartierLujan, GuilhermeGuilhermeLujanKerber, AndreasAndreasKerberKaushik, VidyaVidyaKaushikChen, P.J.P.J.ChenDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6498Investigation of poly-Si/HfO2 gate stacks in a self-aligned 65 nm NMOS process flowOral presentation