Defects reduction and characterization of epitaxial Si:C/Si:C:P layers grown using cyclic deposition and etching technique

Dhayalan, Sathish KumarSathish KumarDhayalanLoo, RogerRogerLooRosseel, ErikErikRosseelHikavyy, AndriyAndriyHikavyyShimura, YosukeYosukeShimuraNuytten, ThomasThomasNuyttenDouhard, BastienBastienDouhardVandervorst, WilfriedWilfriedVandervorst2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/23764Defects reduction and characterization of epitaxial Si:C/Si:C:P layers grown using cyclic deposition and etching techniqueMeeting abstracthttp://www.emrs-strasbourg.com/index.php?option=com_abstract&task=view&id=276&day=2014-09-15&year=2014&Itemid=&id_season=12