Thickness scaling of NiAl thin films for alternative interconnect metallization

Soulie, Jean-PhilippeJean-PhilippeSoulieTokei, ZsoltZsoltTokeiSwerts, JohanJohanSwertsAdelmann, ChristophChristophAdelmann2021-10-292021-10-292020https://imec-publications.be/handle/20.500.12860/35995Thickness scaling of NiAl thin films for alternative interconnect metallizationProceedings paper10.1109/IITC47697.2020.9515638