Attenuated phase shift masks: an interview with Andreas Erdmann

Gallagher, EmilyEmilyGallagher2023-04-252023-03-012023-03-072023-04-2520221932-5150WOS:000924949300003https://imec-publications.be/handle/20.500.12860/41204Attenuated phase shift masks: an interview with Andreas ErdmannEditorial material10.1117/1.jmm.21.4.040402WOS:000924949300003Engineeringphase shift, EUV lithography, mask