Gao, TengTengGaoGray, WilliamWilliamGrayVan Hove, MarleenMarleenVan HoveRosseel, ErikErikRosseelStruyf, HerbertHerbertStruyfMeynen, HermanHermanMeynenVanhaelemeersch, SergeSergeVanhaelemeerschMaex, KarenKarenMaex2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3459Low-k materials etch and strip optimization for sub 0.25µm technologyProceedings paper