Effect of top power on low-k damage during oxygen strip in a TCP etch chamber

Kunnen, EddyEddyKunnenShamiryan, DenisDenisShamiryanStruyf, HerbertHerbertStruyfBoullart, WernerWernerBoullartBaklanov, MikhaïlMikhaïlBaklanov2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15633Effect of top power on low-k damage during oxygen strip in a TCP etch chamberOral presentation