Atomic layer deposition of aluminum phosphate layers using tris(dimethylamino)phosphine as P-precursor

Blomme, RubenRubenBlommeChalishazar, AdityaAdityaChalishazarHenderick, LowieLowieHenderickMunnik, FransFransMunnikMeersschaut, JohanJohanMeersschautMinjauw, Matthias M.Matthias M.MinjauwDetavernier, ChristopheChristopheDetavernierDendooven, JolienJolienDendooven2025-03-042025-03-042025-MAR0734-2101WOS:001428795000001https://imec-publications.be/handle/20.500.12860/45287Atomic layer deposition of aluminum phosphate layers using tris(dimethylamino)phosphine as P-precursorJournal article10.1116/6.0004267WOS:001428795000001THIN-FILMSSPECTROSCOPYGLASSESGROWTH