H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrity

Schmidt, HaraldHaraldSchmidtMeuris, MarcMarcMeurisRotondaro, AntonioAntonioRotondaroHeyns, MarcMarcHeynsHurd, TraceTraceHurdHatcher, Z.Z.Hatcher2021-09-292021-09-291995https://imec-publications.be/handle/20.500.12860/853H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrityJournal article