Resist evaluation using EUV interference lithography

Gronheid, RoelRoelGronheidVan Roey, FriedaFriedaVan RoeyGoethals, MiekeMiekeGoethalsLeunissen, PeterPeterLeunissenVan Steenwinckel, DavidDavidVan SteenwinckelSolak, H.H.H.H.Solak2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8987Resist evaluation using EUV interference lithographyOral presentation