Ni- and Co-based silicides for advanced CMOS applications

Kittl, JorgeJorgeKittlLauwers, AnneAnneLauwersChamirian, OxanaOxanaChamirianVan Dal, MarkMarkVan DalAkheyar, AmalAmalAkheyarde Potter de ten Broeck, MurielMurielde Potter de ten BroeckLindsay, RichardRichardLindsayMaex, KarenKarenMaex2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7740Ni- and Co-based silicides for advanced CMOS applicationsJournal article