Zhang, LipingLipingZhangLeffaucheux, P.P.LeffaucheuxTillocher, T.T.TillocherDussart, R.R.DussartMankelevich, Y.Y.Mankelevichde Marneffe, Jean-FrancoisJean-Francoisde MarneffeDe Gendt, StefanStefanDe GendtBaklanov, MikhaïlMikhaïlBaklanov2021-10-212021-10-2120131099-0062https://imec-publications.be/handle/20.500.12860/23442Damage free cryogenic etching of a porous organosilica ultralow-k filmJournal article