The potential of double patterning immersion lithography for the 32nm half pitch node

Wiaux, VincentVincentWiauxStorms, GreetGreetStormsCheng, ShauneeShauneeChengMaenhoudt, MireilleMireilleMaenhoudt2021-10-162021-10-162007-08https://imec-publications.be/handle/20.500.12860/13225The potential of double patterning immersion lithography for the 32nm half pitch nodeJournal articlehttp://www.euroasiasemiconductor.com/print.php?id=8451