Strain and composition monitoring in various (Si)Ge fin structures using in-line HRXRD

Schulze, AndreasAndreasSchulzeLoo, RogerRogerLooWitters, LiesbethLiesbethWittersMertens, HansHansMertensCollaert, NadineNadineCollaertHoriguchi, NaotoNaotoHoriguchiWormington, MatthewMatthewWormingtonRyan, PaulPaulRyanVandervorst, WilfriedWilfriedVandervorstCaymax, MattyMattyCaymax2021-10-242021-10-242017https://imec-publications.be/handle/20.500.12860/29401Strain and composition monitoring in various (Si)Ge fin structures using in-line HRXRDMeeting abstract