Urbanowicz, AdamAdamUrbanowiczShamiryan, DenisDenisShamiryanMarsik, PremyslPremyslMarsikTravaly, YoussefYoussefTravalyJonas, AlainAlainJonasVerdonck, PatrickPatrickVerdonckVanstreels, KrisKrisVanstreelsFerchichi, AbdelkarimAbdelkarimFerchichiDe Roest, DavidDavidDe RoestSprey, HesselHesselSpreyMatsushita, KiyohiroKiyohiroMatsushitaKaneko, ShinyaShinyaKanekoTsuji, NaotoNaotoTsujiLuo, ShijianShijianLuoEscorcia, OrlandoOrlandoEscorciaBerry, IvanIvanBerryWaldfried, CarloCarloWaldfriedDe Gendt, StefanStefanDe GendtBaklanov, MikhaïlMikhaïlBaklanov2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16335Improved low-k dielectric properties using He/H2 plasma for resist removalProceedings paper