Hikavyy, AndriyAndriyHikavyyPorret, ClémentClémentPorretRosseel, ErikErikRosseelFavia, PaolaPaolaFaviaLoo, RogerRogerLoo2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/33161Extremely low temperature selective epitaxial processes for advanced CMOS applicationsProceedings paper