Impact of high-K gate stack material with metal gates on LF noise in n- and p MOSFETs

Srinivasan, PurushothamanPurushothamanSrinivasanSimoen, EddyEddySimoenPantisano, LuigiLuigiPantisanoClaeys, CorCorClaeysMisra, D.D.Misra2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11262Impact of high-K gate stack material with metal gates on LF noise in n- and p MOSFETsJournal article